The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Aug. 14, 2012
Kanya Ishizaka, Kanagawa, JP;
Kanya Ishizaka, Kanagawa, JP;
Fuji Xerox Co., Ltd., Tokyo, JP;
Abstract
An image processing mask creating method includes calculating cluster energy of each point in an image processing mask, ranking the points in ascending order or descending order on the basis of the calculated cluster energy values, and allocating threshold values to the points in the image processing mask on the basis of the ranks as the process result of the ranking, wherein the cluster energy is defined as the sum of interaction values f(∥x−y∥) having the distance ∥x−y∥ between a target point x and a point y belonging to a cluster not including the target point x as a parameter.
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