The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2014

Filed:

Nov. 11, 2010
Applicants:

Yuta Funahashi, Hyogo, JP;

Tetsuya Kawamura, Hyogo, JP;

Masafumi Hirata, Chiba, JP;

Inventors:

Yuta Funahashi, Hyogo, JP;

Tetsuya Kawamura, Hyogo, JP;

Masafumi Hirata, Chiba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01); G02F 1/13 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a manufacturing method for a liquid crystal display device, in which a semiconductor pattern and a metal pattern are formed so that the semiconductor pattern includes a first portion formed under the metal pattern and a second portion which outwardly extends off the metal pattern from the first portion. An insulating layer for covering the metal pattern and the semiconductor pattern is formed. The insulating layer is subjected to etching in a first region located above the metal pattern and in a second region located above at least the second portion of the semiconductor pattern. In the etching step, the insulating layer in the first region is subjected to etching to form a through hole for electrical connection to the metal pattern, and the insulating layer and the semiconductor pattern in the second region are subjected to etching to remove the second portion of the semiconductor pattern.


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