The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Nov. 18, 2011
Applicants:
Keon Woo Lee, Daejeon, KR;
Sang Kyu Kwak, Daejeon, KR;
Changsoon Lee, Daejeon, KR;
Hyehyeon Kim, Seoul, KR;
Inventors:
Keon Woo Lee, Daejeon, KR;
Sang Kyu Kwak, Daejeon, KR;
Changsoon Lee, Daejeon, KR;
Hyehyeon Kim, Seoul, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 (2006.01); C07C 69/94 (2006.01); C07C 69/602 (2006.01); G03F 7/027 (2006.01); G03F 7/033 (2006.01); G03F 7/032 (2006.01); C07C 69/92 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); G03F 7/033 (2013.01); G03F 7/032 (2013.01); C07C 69/92 (2013.01); C07C 69/94 (2013.01); C07C 69/602 (2013.01);
Abstract
The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.