The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2014

Filed:

Jun. 21, 2011
Applicants:

Jaegoo Lee, Hwasung, KR;

Byungkwan You, Hwasung, KR;

Youngwoo Park, Hwasung, KR;

Kwang Soo Seol, Yongin-si, KR;

Inventors:

Jaegoo Lee, Hwasung, KR;

Byungkwan You, Hwasung, KR;

Youngwoo Park, Hwasung, KR;

Kwang Soo Seol, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/3205 (2006.01); H01L 21/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods of manufacturing three-dimensional semiconductor devices that may include forming a first spacer on a sidewall inside a first opening formed in a first stack structure, forming a sacrificial filling pattern on the spacer to fill the first opening, forming a second stack structure including a second opening exposing the sacrificial filling pattern on the first stack structure, forming a second spacer on a sidewall inside the second opening, removing the sacrificial filling pattern and removing the first spacer and the second spacer.


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