The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Sep. 23, 2011
Applicants:
Seung-bae OH, Uiwang-si, KR;
Hwan-sung Cheon, Uiwang-si, KR;
Sung-wook Cho, Uiwang-si, KR;
Min-soo Kim, Uiwang-si, KR;
Jee-yun Song, Uiwang-si, KR;
Yoo-jeong Choi, Uiwang-si, KR;
Inventors:
Seung-Bae Oh, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Sung-Wook Cho, Uiwang-si, KR;
Min-Soo Kim, Uiwang-si, KR;
Jee-Yun Song, Uiwang-si, KR;
Yoo-Jeong Choi, Uiwang-si, KR;
Assignee:
Cheil Industries, Inc., Gumi-Si, Kyeongsangbuk-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract
A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and a compound, the compound including a structural unit represented by the following Chemical Formula 1: