The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Jun. 17, 2009
Victor Boris Sapozhnikov, Minnetonka, MN (US);
Taras Grigorievich Pokhil, Arden Hills, MN (US);
Konstantin Nikolaev, Edina, MN (US);
Victor Boris Sapozhnikov, Minnetonka, MN (US);
Taras Grigorievich Pokhil, Arden Hills, MN (US);
Konstantin Nikolaev, Edina, MN (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A method of creating a stack having multiple layers of material deposited onto a substrate. The method includes controlling atom mobility to provide a uniform thickness for the deposited layers and increasing or decreasing a deposition temperature to control the atom mobility and/or roughness for the deposited layers. In an illustrated embodiment, the deposition temperature is increased to increase the atom mobility and the deposition temperature is decreased to decrease the atom mobility to control roughness and provide a uniform layer thickness. In another embodiment, the deposition temperature is increased or decreased for different portions of a layer. As described, a first amount of a material is deposited at a first deposition temperature to provide an optimum surface interface with a prior layer and a second amount of the material is deposited at a second deposition temperature to provide a uniform layer thickness.