The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2014

Filed:

Nov. 18, 2013
Applicants:

Minoru Asogawa, Tokyo, JP;

Hisashi Hagiwara, Kanagawa, JP;

Tohru Hiramatsu, Nagano, JP;

Inventors:

Minoru Asogawa, Tokyo, JP;

Hisashi Hagiwara, Kanagawa, JP;

Tohru Hiramatsu, Nagano, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A channel control mechanism for a microchip has a laminated structure formed of members including elastic members, and includes: a sample reservoir for packing a sample therein; a reaction reservoir in which mixture and reaction of the sample are performed; and a channel formed in a middle layer of the laminated structure, for bringing the sample reservoir and the reaction reservoir into communication with each other. The channel control mechanism performs the reaction and analysis in such a manner that the sample is delivered into the reaction reservoir through the channel. A shutter channel (pressurizing channel) is provided in a layer different from a layer in which the channel is formed so that the pressurizing channel partially overlaps the channel. The channel is closed through applying a pressurized medium to the shutter channel (pressurizing channel), and the channel is opened through releasing a pressure of the pressurized medium.


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