The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Aug. 30, 2012
Sangwuk Park, Gyeonggi-do, KR;
Kye Hyun Baek, Gyeonggi-do, KR;
Kyoungsub Shin, Gyeonggo-do, KR;
Brad H. Lee, Gyeonggi-do, KR;
Sangwuk Park, Gyeonggi-do, KR;
Kye Hyun Baek, Gyeonggi-do, KR;
Kyoungsub Shin, Gyeonggo-do, KR;
Brad H. Lee, Gyeonggi-do, KR;
Abstract
Methods for optimizing a plasma process are provided. The method may include obtaining a measurement spectrum from a plasma reaction in a chamber, calculating a normalized measurement standard and a normalized measurement spectrum of the measurement spectrum, comparing the normalized measurement spectrum with a normalized reference spectrum, and comparing the normalized measurement standard with a normalized reference standard to determine whether to change a process parameter of the plasma process or clean the chamber when the normalized measurement spectrum and the normalized reference spectrum are mismatched.