The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Apr. 30, 2007
Nobuhiro Yasui, Kawasaki, JP;
Ryoko Horie, Yokohama, JP;
Toru Den, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of forming a film, including the steps of preparing a base plate having a first region and a second region comprised of mutually different materials wherein at least one of the materials is an oxide and selectively conducting a film deposition on either one of the first region and the second region by a bias sputtering. Both the first and second regions can be formed of an oxide. Further, provided is a vapor film deposition method including irradiating a substrate having a plurality of regions of different constituent element groups composed of at least one element with a source material element group composed of at least one element to be deposited and ionized elements.