The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Sep. 23, 2011
Robert Frushour, Ann Arbor, MI (US);
Robert Frushour, Ann Arbor, MI (US);
Other;
Abstract
A method for making PDC with excellent abrasion resistance at high pressure in a single HPHT step without introducing high residual internal stress. In one aspect of the method, the diamond mass is subjected to an initial high pressure to compact the mass. The initial pressure is then lowered to a second pressure prior to the application of heat to the reaction cell. In another aspect, the diamond mass is subjected to an initial pressure to compact the mass, followed by raising the temperature to melt the sintering aid. The initial pressure is then lowered to a second pressure prior to lowering the temperature below the melting point of the sintering aid.