The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2014
Filed:
Jan. 25, 2011
Sandhya Arun, Bangalore, IN;
Prashanth Kodigepalli, Bangalore, IN;
Padma Gopalakrishnan, Fremont, CA (US);
Ashish Bhatnagar, Fremont, CA (US);
Dan Martin, Cupertino, CA (US);
Christopher Heath John Hossack, Gilbert, AZ (US);
Sandhya Arun, Bangalore, IN;
Prashanth Kodigepalli, Bangalore, IN;
Padma Gopalakrishnan, Fremont, CA (US);
Ashish Bhatnagar, Fremont, CA (US);
Dan Martin, Cupertino, CA (US);
Christopher Heath John Hossack, Gilbert, AZ (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring and an outer ring disposed radially outward of the inner ring. The inner ring will correspond to the location where the majority of erosion occurs during use. This inner ring can be flipped and reused until both sides have eroded beyond their service life. Collectively, the two rings generally have the shape of a single piece ring, but the service life of the ring assembly is longer than a conventional single piece ring.