The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2014

Filed:

Apr. 07, 2011
Applicants:

Lutz Rebstock, Gaienhofen, DE;

Klaus Conrad Wolke, Althengstett, DE;

Inventors:

Lutz Rebstock, Gaienhofen, DE;

Klaus Conrad Wolke, Althengstett, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 1/10 (2006.01); B05C 1/08 (2006.01); B05C 1/06 (2006.01); B05C 13/02 (2006.01); B05C 1/02 (2006.01); B05C 9/04 (2006.01); B05D 1/28 (2006.01);
U.S. Cl.
CPC ...
B05C 1/0808 (2013.01); B05C 1/10 (2013.01); B05C 1/025 (2013.01); B05C 9/04 (2013.01); B05D 1/28 (2013.01); B05D 2252/10 (2013.01);
Abstract

Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.


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