The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2014

Filed:

Sep. 20, 2010
Applicants:

Gerard Antkowiak, Jena, DE;

Thomas Pabst, Stadtroda, DE;

Ralf Ebersbach, Schmölln, DE;

Heino Weigand, Jena, DE;

Martin Hacker, Jena, DE;

Inventors:

Gerard Antkowiak, Jena, DE;

Thomas Pabst, Stadtroda, DE;

Ralf Ebersbach, Schmölln, DE;

Heino Weigand, Jena, DE;

Martin Hacker, Jena, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical deflection unit for targeted radiation, e.g., produced by laser or superluminescent diodes, in scanning, ophthalmological measuring and therapy systems, comprises a deflection mirror, a position sensor and a control unit, which form a control circuit for minimizing the deviation of the actual positions, detected by the position sensor, from the desired positions of the deflection mirror, whereby the optical deflection unit comprises a deflection mirror, oscillatingly movable by means of non-contacting electromagnetic drives around at least one rotation axis, and which is positioned in the direction of the, at least, one rotation axis between at least two bearings. The optical deflection unit is designed may also be used for beam guidance in high and ultrahigh vacuum installations, such as UV and EUV exposure installations for semiconductor lithography.


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