The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Jan. 15, 2010
Randall Urdahl, Mountain View, CA (US);
James Edward Cooley, San Francisco, CA (US);
Gregory S. Lee, Mountain View, CA (US);
August Jon Hidalgo, San Francisco, CA (US);
Martin L. Guth, Colorado Springs, CO (US);
Randall Urdahl, Mountain View, CA (US);
James Edward Cooley, San Francisco, CA (US);
Gregory S. Lee, Mountain View, CA (US);
August Jon Hidalgo, San Francisco, CA (US);
Martin L. Guth, Colorado Springs, CO (US);
Agilent Technologies, Inc., Santa Clara, CA (US);
Abstract
A plasma generation device includes: a substrate having a first surface and a second surface; a stripline resonant ring disposed on the first surface of the substrate, and defining a discharge gap; a pair of electrode extensions connected to the stripline resonant ring at the discharge gap; a ground plane disposed on the second surface of the substrate; a gas flow element configured to flow gas between at least one of: (1) the discharge gap, and (2) the pair of electrode extensions; and a structure disposed adjacent the substrate to form an enclosure that substantially encloses at least a region including the discharge gap and the electrode extensions, the enclosure being adapted to contain a plasma.