The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Dec. 14, 2007
Applicants:
Moritz Nitschke, Freiburg, DE;
Gerhard Zaehringer, Freiburg, DE;
Inventors:
Moritz Nitschke, Freiburg, DE;
Gerhard Zaehringer, Freiburg, DE;
Assignee:
TRUMPF Huettinger GmbH + Co. KG, Freiburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed.