The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Feb. 19, 2010
Applicants:
Ching AU, Port Washington, NY (US);
Krithika Kalyanasundaram, Hauppauge, NY (US);
Inventors:
Ching Au, Port Washington, NY (US);
Krithika Kalyanasundaram, Hauppauge, NY (US);
Assignee:
R.S.M. Electron Power, Inc., Deer Park, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for making a liquid barrier includes forming a liquid barrier layer on a substrate, forming a mask layer on the liquid barrier layer such that part of the liquid barrier remains exposed, forming a contact layer on the exposed liquid barrier layer, and removing the mask layer to expose the part of the liquid barrier layer which was covered by the mask layer. A liquid wetting boundary is formed when the wettability on the liquid barrier surface area is less than the wettability of the contact surface area.