The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2014
Filed:
Jun. 17, 2013
Dalian University of Technology, Dalian, CN;
Zhuhai Ninestar Management, Co., Ltd., Zhuhai, CN;
Xiaojun Peng, Dalian, CN;
Jinhe Wu, Dalian, CN;
Zhi Long, Dalian, CN;
Rong Zhang, Dalian, CN;
Licheng Liaoning, Dalian, CN;
Feng Wang, Zhuhai, CN;
Shaolei Li, Zhuhai, CN;
Jiangli Fan, Dalian, CN;
Fengling Song, Dalian, CN;
Shiguo Sun, Dalian, CN;
Dalian University of Technology, Dalian, CN;
Zhuhai Ninestar Management Co., Ltd., Zhuhai, CN;
Abstract
The present invention relates to compounds shown in the general formula (I) or (III), the salts thereof or their mixtures, as well as their preparation method and application. In the general formula (I), Xis H or COH; Xis OH or phenyl group with 0-2 sulfonic acid substituents, and the sulfonic acid substituents are located at random positions of a benzene ring; when Xis OH, Xis H; when Xis phenyl group with 0-2 sulfonic acid substituents, Xis H or COH; n is an integer of 0-2; and in the general formula (III), n and m are respectively an integer of 0-2. The compounds and the mixtures not only have improved light resistance, ozone resistance and water resistance, but also have excellent water solubility and long-term stability in ink-jet ink.