The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 2014

Filed:

Feb. 24, 2011
Applicants:

Keishin Yamazaki, Toyama, JP;

Akira Hayashida, Toyama, JP;

Masaaki Ueno, Toyama, JP;

Manabu Izumi, Toyama, JP;

Katsuaki Nogami, Toyama, JP;

Inventors:

Keishin Yamazaki, Toyama, JP;

Akira Hayashida, Toyama, JP;

Masaaki Ueno, Toyama, JP;

Manabu Izumi, Toyama, JP;

Katsuaki Nogami, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A heat treatment apparatus capable of achieving high-accuracy processing and high safety and a method of manufacturing a substrate are provided. The heat treatment apparatusincludes a reaction tubefor processing a substrate, a manifoldfor supporting the reaction tube, a heaterinstalled around the reaction tubeto heat an inner part of the reaction tube, a surrounding memberinstalled to surround a side portion of the reaction tubearranged in a lower portion than the heater; an exhaust devicefor forcibly exhausting a gapbetween the surrounding memberand the reaction tube; and a sealing memberinstalled in a contacting portion between the reaction tubeand the manifold. Here, an inlet holethrough which the exhaust device inhales an atmosphere outside the surrounding memberto the gapis installed in the surrounding member


Find Patent Forward Citations

Loading…