The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Apr. 14, 2008
Kouichi Harada, Kanagawa, JP;
Yasuhiro Ueda, Kanagawa, JP;
Nobuhiko Umezu, Kanagawa, JP;
Kazushi Wada, Kanagawa, JP;
Yoshinori Toumiya, Kanagawa, JP;
Takeshi Matsuda, Kanagawa, JP;
Kouichi Harada, Kanagawa, JP;
Yasuhiro Ueda, Kanagawa, JP;
Nobuhiko Umezu, Kanagawa, JP;
Kazushi Wada, Kanagawa, JP;
Yoshinori Toumiya, Kanagawa, JP;
Takeshi Matsuda, Kanagawa, JP;
Sony Corporation, , JP;
Abstract
A solid-state imaging device includes a layer including an on-chip lens above a sensor section, and the layer including the on-chip lens is composed of an inorganic film which transmits ultraviolet light. The layer including the on-chip lens may further include a planarizing film located below the on-chip lens. A method of fabricating a solid-state imaging device includes the steps of forming a planarizing film composed of a first inorganic film, forming a second inorganic film on the planarizing film, forming a lens-shaped resist layer on the second inorganic film, and etching back the resist layer to form an on-chip lens composed of the second inorganic film. The first inorganic film constituting the planarizing film and the second inorganic film constituting the on-chip lens preferably transmit ultraviolet light.