The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Aug. 13, 2013
Spts Technologies Limited, Newport, GB;
Stephen R Burgess, Gwent, GB;
Anthony P Wilby, Bristol, GB;
SPTS Technologies Limited, Newport, GB;
Abstract
A method of processing a semiconductor workpiece includes placing a back surface of the workpiece on a workpiece support in a chamber so that the front surface of the workpiece faces into the chamber for processing, and the back surface is in fluid communication with a back region having an associated back gas pressure. The method further includes performing a workpiece processing step at a first chamber pressure Pand a first back pressure P, wherein Pand Pgive rise to a pressure differential, P−P, and performing a workpiece cooling step at a second chamber pressure Pand a second back pressure P, wherein Pand Pare higher than Pand P, respectively.