The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
May. 27, 2010
Katsutoshi Hirashima, Ibaraki, JP;
Hirofumi Fujii, Ibaraki, JP;
Yasushi Tamura, Ibaraki, JP;
Ryouji Suezaki, Ibaraki, JP;
Katsutoshi Hirashima, Ibaraki, JP;
Hirofumi Fujii, Ibaraki, JP;
Yasushi Tamura, Ibaraki, JP;
Ryouji Suezaki, Ibaraki, JP;
Nitto Denko Corporation, Ibaraki-shi, Osaka, JP;
Abstract
A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning. The negative photosensitive material comprises: wherein R, R, R, Rand R, which may be the same or different, are each a Cto Calkyl group, and Ar is an aryl group having a nitro group at its ortho position, wherein R, R, Rand R, which may be the same or different, are each a Cto Calkyl group, and Ar is an aryl group having a nitro group at its ortho position.