The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Oct. 09, 2008
Applicants:
Beat Schmidt, Montrond les Bains, FR;
Christophe Heau, Saint Etienne, FR;
Philippe Maurin-perrier, St Marcellin en Forez, FR;
Inventors:
Beat Schmidt, Montrond les Bains, FR;
Christophe Heau, Saint Etienne, FR;
Philippe Maurin-Perrier, St Marcellin en Forez, FR;
Assignee:
H.E.F., Andrezieux Boutheon, FR;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); H01J 37/32 (2006.01); C23C 16/458 (2006.01); C23C 16/511 (2006.01); C23C 16/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32678 (2013.01); H01J 37/32192 (2013.01); H01J 37/32733 (2013.01); C23C 16/4584 (2013.01); C23C 16/4582 (2013.01); C23C 16/511 (2013.01); C23C 16/26 (2013.01);
Abstract
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.