The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Jul. 28, 2010
Hyuneui Lim, Daejeon, KR;
Seungmuk Ji, Daejeon, KR;
Jun-hee Lee, Daejeon, KR;
Wan-doo Kim, Daejeon, KR;
Hyuneui Lim, Daejeon, KR;
Seungmuk Ji, Daejeon, KR;
Jun-Hee Lee, Daejeon, KR;
Wan-Doo Kim, Daejeon, KR;
Abstract
Provided is a fabrication method for a functional surface that has self-cleaning ability and superhydrophilic anti-reflective property, which includes a) arranging a plurality of beads having a sphere shape on a surface of a transparent substrate; b) forming a predetermined inter-bead gap by etching the plurality of beads; c) forming a surface unevenness on the surface of the substrate by etching the substrate using the plurality of the beads having the predetermined gap as an etching mask; d) removing the plurality of the beads from the surface of the substrate; and e) forming a photocatalytic layer or a compound layer having a surface tension of 18 to 28 N/m on the surface of the substrate formed with the surface unevenness.