The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2014

Filed:

Aug. 23, 2012
Applicants:

Masakatsu Ikisawa, Ibaraki, JP;

Masataka Yahagi, Ibaraki, JP;

Kozo Osada, Ibaraki, JP;

Takashi Kakeno, Ibaraki, JP;

Inventors:

Masakatsu Ikisawa, Ibaraki, JP;

Masataka Yahagi, Ibaraki, JP;

Kozo Osada, Ibaraki, JP;

Takashi Kakeno, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 1/08 (2006.01); B05D 5/00 (2006.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An amorphous film comprising indium, tin, calcium and oxygen, wherein tin is contained at a ratio of 5 to 15% based on an atomicity ratio of Sn/(In+Sn+Ca) and calcium is contained at a ratio of 0.1 to 2.0% based on an atomicity ratio of Ca/(In+Sn+Ca), and remnant is indium and oxygen, is provided. The film can be crystallized by annealing at 260° C. or lower in which resistivity of the film will be 0.4 mΩcm or less. In this manner, an ITO thin film for use as a display electrode or the like in a flat panel display can be made into an amorphous ITO film by way of sputter deposition without heating the substrate or adding water during deposition. This ITO film can be crystallized by annealing at a low temperature and will have low resistivity. Methods of producing such films and sintered compacts are provided.


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