The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2014

Filed:

Sep. 22, 2009
Applicants:

Andreas Bibl, Los Altos, CA (US);

Christoph Menzel, New London, NH (US);

Corina Nistorica, San Jose, CA (US);

Gregory Debrabander, San Jose, CA (US);

Inventors:

Andreas Bibl, Los Altos, CA (US);

Christoph Menzel, New London, NH (US);

Corina Nistorica, San Jose, CA (US);

Gregory DeBrabander, San Jose, CA (US);

Assignee:

FUJIFILM Dimatix, Inc., Lebanon, NH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 29/393 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is described wherein one or more parameters are measured that affect the nozzle velocity at which a printing fluid is ejected from a pumping chamber through a nozzle. The printing fluid is contained in the pumping chamber actuated by deflection of a piezoelectric layer. A surface area of an electrode actuating the piezoelectric layer is reduced based at least in part on the measured one or more parameters. Reducing the surface area of the electrode reduces the actuated area of the piezoelectric layer.


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