The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Feb. 21, 2008
Curtis Boney, Houston, TX (US);
Curtis Boney, Houston, TX (US);
Schlumberger Technology Corporation, Sugar Land, TX (US);
Abstract
Methods are circulated degradable material assisted diversion (CMAD) for well treatment in completed wells. A slurry of solid degradable material is circulated in the well with return of excess slurry, a plug of the degradable material is formed, a downhole operation is performed around the plug diverter, and the plug is then degraded for removal. Degradation triggers can be temperature or chemical reactants, with optional accelerators or retarders to provide the desired timing for plug removal. In multilayer formation CMAD fracturing, the plug isolates a completed fracture while additional layers are sequentially fractured and plugged, and then the plugs are removed for flowback from the fractured layers.