The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Jan. 24, 2012
Philip Don Floyd, Redwood City, CA (US);
Wilhelmus Adrianus DE Groot, Palo Alto, CA (US);
Philip Don Floyd, Redwood City, CA (US);
Wilhelmus Adrianus de Groot, Palo Alto, CA (US);
QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);
Abstract
An array of MEMS shutters may incorporate opaque and/or interference-based film stacks, to control light in a window. The shutter structure may include one or more layers with a controlled stress gradient, which makes a shutter arm curl out of plane and away from a defined aperture for light, thus permitting light to be transmitted through a transparent substrate and past the MEMS structure. To close the shutter, a voltage may be applied between an electrode in the shutter arm and an electrode covering a region on the substrate, rolling the shutter arm flat against the substrate electrode and placing the shutter arm over the aperture. The shutter arm may be configured to transmit selected wavelengths of light. In some implementations, the shutter arm may be configured to filter out infrared light.