The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 13, 2014

Filed:

Oct. 12, 2012
Applicant:

Leica Microsystems Cms Gmbh, Wetzlar, DE;

Inventors:

Werner Knebel, Kronau, DE;

Tobias Bauer, Koenigstein, DE;

Peter Euteneuer, Lahnau, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/00 (2006.01); G01N 21/41 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus provide identification of a spherical error of a microscope imaging beam path in a context of microscopic imaging of a sample using a microscope having an objective. A coverslip that carries or covers the sample is arranged in the imaging beam path. A measurement beam is guided through the objective onto the sample in a decentered fashion that is outside an optical axis of the objective. The measurement beam is reflected at an interface of the coverslip with the sample and the reflected measurement beam is guided through the objective onto a detector. An intensity profile of the reflected measurement beam is detected with the detector and a presence of a spherical error from the intensity profile is determined qualitatively and/or quantitatively.


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