The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Nov. 18, 2011
Applicants:
Hiroyuki Nagasaka, Kumagaya, JP;
Kenichi Shiraishi, Saitama, JP;
Tomoharu Fujiwara, Ageo, JP;
Soichi Owa, Kumagaya, JP;
Akihiro Miwa, Fukaya, JP;
Inventors:
Hiroyuki Nagasaka, Kumagaya, JP;
Kenichi Shiraishi, Saitama, JP;
Tomoharu Fujiwara, Ageo, JP;
Soichi Owa, Kumagaya, JP;
Akihiro Miwa, Fukaya, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01); G03F 7/70891 (2013.01); G03F 7/70858 (2013.01);
Abstract
An exposure apparatus includes an immersion space forming member () which fills an optical path space (K) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism () which suppresses a change in the temperature of the immersion space forming member () accompanying deactivation of formation of the immersion space.