The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8724076 B1

PDF
Full Text
Expired
Date of Patent:
May. 13, 2014

Filed:

Mar. 21, 2011
Applicants:

Yasuhisa Tani, Tokyo, JP;

Masaki Shiozawa, Sagamihara, JP;

Inventors:

Yasuhisa Tani, Tokyo, JP;

Masaki Shiozawa, Sagamihara, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.


Find Patent Forward Citations

Tani, Yasuhisa. (2014). Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method (U.S. Patent No. 8724076). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8724076

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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