The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Sep. 25, 2008
Shih-chung Wang, Hsin-Chu, TW;
Shih-Chung Wang, Hsin-Chu, TW;
MStar Semiconductor, Inc., ChuPei, Hsin-Chu Hsien, TW;
Abstract
A method of forming a dithering mask includes providing a specific sub-dithering mask, and generating a plurality of sub-dithering masks of the dithering mask by adjusting the specific sub-dithering mask. The dithering mask generated by the method includes a plurality of sub-dithering masks, each sub-dithering mask includes (4N)×(4N) dithering values, where N is an integer, and at least two sub-dithering masks of the plurality of sub-dithering masks have different contents. By breaking the regularity in the dithering mask, flickering patterns or visual patterns can be avoided on the screen, thereby raising the displaying quality of the screen.