The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Jul. 23, 2010
Applicant:
Atsushi Mark Takahashi, Menlo Park, CA (US);
Inventor:
Atsushi Mark Takahashi, Menlo Park, CA (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 33/48 (2006.01); G01R 33/483 (2006.01); G01R 33/46 (2006.01);
U.S. Cl.
CPC ...
G01R 33/4816 (2013.01); G01R 33/4833 (2013.01); G01R 33/4633 (2013.01); G01R 33/4641 (2013.01);
Abstract
The present embodiments are directed towards artifact reduction in slice select pulse sequences utilized in ultra short echo time imaging sequences. In one embodiment, a method includes determining a desired slice select thickness, determining a radiofrequency pulse shape and duration based upon the desired slice select thickness while maintaining a desired relationship between excitation k space and radiofrequency amplitude, and determining radiofrequency scaling based on the determined radiofrequency pulse shape and duration.