The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Sep. 30, 2009
Takeshi Tachibana, Tottori, JP;
Satoru Tanaka, Tottori, JP;
Keiko Kikuchi, Kumagaya, JP;
Hitachi Metals, Ltd., Tokyo, JP;
Abstract
A method for analyzing the DC superposition characteristics of an inductance device using an electromagnetic field simulator, comprising a first step of determining an initial magnetization curve from initial magnetization to saturation magnetization, and pluralities of minor loops at different operating points, on a toroidal core made of the same magnetic material as that of the inductance device, and obtaining point-list data showing the relation between magnetic flux density or magnetic field strength and incremental permeability from the incremental permeability at each operating point; a second step of determining an operating point at a predetermined direct current on each element obtained by mesh-dividing an analysis model of the inductance device by an electromagnetic field simulator based on the initial magnetization curve of the core, allocating the incremental permeability to the operating point from the point-list data, and integrating the inductance of each element obtained from the incremental permeability to determine the inductance of the entire inductance device; and a third step of repeating the second step at different direct current levels to determine the DC superposition characteristics.