The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Mar. 25, 2010
Reza Abhari, Forch, CH;
Andrea Giovannini, Lugano, CH;
Bob Rollinger, Zürich, CH;
Davide Bleiner, Zürich, CH;
Reza Abhari, Forch, CH;
Andrea Giovannini, Lugano, CH;
Bob Rollinger, Zürich, CH;
Davide Bleiner, Zürich, CH;
ETH Zürich, Zürich, CH;
Abstract
The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (), and a collector optics () for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics () in order to protect the collector optics () from debris () generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (). By thus shielding the collector optics () from the debris () its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics ().