The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Nov. 30, 2011
Applicants:
Hiroyuki Nagasaka, Kumagaya, JP;
Hiroshi Morita, Hadano, JP;
Hiroto Tokoshima, Shimotsuga-gun, JP;
Inventors:
Assignees:
Nikon Corporation, Tokyo, JP;
Kurita Water Industries Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
Nagasaka, Hiroyuki. (2014). Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method (U.S. Patent No. 8721803). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8721803
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile