The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2014
Filed:
Oct. 29, 2010
James P. Cruse, Santa Cruz, CA (US);
Dermot Cantwell, Sunnyvale, CA (US);
Ming Xu, San Jose, CA (US);
Charles Hardy, San Jose, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Andrew Nguyen, San Jose, CA (US);
Zhifeng Sui, Fremont, CA (US);
Evans Lee, Milpitas, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Dermot Cantwell, Sunnyvale, CA (US);
Ming Xu, San Jose, CA (US);
Charles Hardy, San Jose, CA (US);
Benjamin Schwarz, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Andrew Nguyen, San Jose, CA (US);
Zhifeng Sui, Fremont, CA (US);
Evans Lee, Milpitas, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include providing a substrate to the first process chamber of the twin chamber processing system, wherein the first process chamber has a first processing volume that is independent from a second processing volume of the second process chamber; providing one or more processing resources from the shared processing resources to only the first processing volume of the first process chamber; and performing a process on the substrate in the first process chamber.