The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Apr. 20, 2012
Rene Gerrit Heideman, Oldenzaal, NL;
Marcel Hoekman, Enschede, NL;
Rene Gerrit Heideman, Oldenzaal, NL;
Marcel Hoekman, Enschede, NL;
Octrolix BV, , NL;
Abstract
A method for forming a tapered region in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer. The accelerator layer is exposed to a first etch that removes the second material in a first region and laterally etches the accelerator layer along a second region to expose the first layer in the second region to the first etch. Since the time for which the first layer is exposed to the first etch in the second region is based on the progress of the lateral etch of the accelerator layer, the first etch tapers the first layer in the second region.