The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2014

Filed:

Apr. 09, 2010
Applicants:

Yasuhiro Ohnishi, Kyotanabe, JP;

Masatoshi Kimachi, Katano, JP;

Masaki Suwa, Kyoto, JP;

Shree Nayar, New York, NY (US);

Inventors:

Yasuhiro Ohnishi, Kyotanabe, JP;

Masatoshi Kimachi, Katano, JP;

Masaki Suwa, Kyoto, JP;

Shree Nayar, New York, NY (US);

Assignee:

OMRON Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/30 (2006.01); G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

An observing apparatus includes a lighting device for irradiating a surface of a measuring target with light having a first light source distribution, and an imaging section for imaging the surface of the measuring target. Considering a first plane passing through a measurement point, the first light source distribution is set such that: (1) a radiance L(θ) changes in a continuous or stepwise manner according to an angle θ, and (2) the radiance L(θ) is not zero in a local region of a predetermined range of ±σ having a point located at a predetermined angle θc as a center on the first plane when viewed from the measurement point, and the following equation substantially holds for arbitrary a satisfying 0<a≦σ; L(θ−a)+L(θ+a)=2×L(θ).


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