The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2014

Filed:

Dec. 31, 2012
Applicants:

Amy Tseng, Woodridge, IL (US);

Brian V. Jenkins, Warrenville, IL (US);

Robert M. Mack, Milwaukie, OR (US);

Inventors:

Amy Tseng, Woodridge, IL (US);

Brian V. Jenkins, Warrenville, IL (US);

Robert M. Mack, Milwaukie, OR (US);

Assignee:

Nalco Company, Naperville, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/75 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.


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