The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Aug. 14, 2008
Vlad Temchenko, Dresden, DE;
Chinteong Lim, Dresden, DE;
Jens Schneider, Moritzburg, DE;
Yves Fabien Rody, Dresden, DE;
Vlad Temchenko, Dresden, DE;
Chinteong Lim, Dresden, DE;
Jens Schneider, Moritzburg, DE;
Yves Fabien Rody, Dresden, DE;
Infineon Technologies AG, Neubiberg, DE;
Abstract
Embodiments of the invention describe a method for exposing an area on a substrate to a beam. The method includes adjusting a focus offset of the beam with respect to the area on the substrate, tilting the beam or tilting the substrate, and exposing the area on the substrate with the beam, thereby generating locations within the area exposed with different foci. Furthermore embodiments describe computer programs for controlling a photolithographic system to do the same and a photolithographic system for doing the same.