The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Dec. 16, 2010
Deepak Upadhyaya, Fremont, CA (US);
Karthik Boinapally, Fremont, CA (US);
William J. Boardman, Danville, CA (US);
Matthew Mamoody, Oakland, CA (US);
Thomas B. Casserly, San Ramon, CA (US);
Pankaj Jyoti Hazarika, Midland, TX (US);
Duc Doan, San Jose, CA (US);
Deepak Upadhyaya, Fremont, CA (US);
Karthik Boinapally, Fremont, CA (US);
William J. Boardman, Danville, CA (US);
Matthew MaMoody, Oakland, CA (US);
Thomas B. Casserly, San Ramon, CA (US);
Pankaj Jyoti Hazarika, Midland, TX (US);
Duc Doan, San Jose, CA (US);
Sub-One Technology, Inc., Pleasanton, CA (US);
Abstract
A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.