The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 06, 2014

Filed:

Sep. 28, 2007
Applicants:

Yimin Guo, San Jose, CA (US);

Grace Gorman, San Jose, CA (US);

Inventors:

Yimin Guo, San Jose, CA (US);

Grace Gorman, San Jose, CA (US);

Assignee:

Headway Technologies, Inc., Milpitas, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

Simultaneous setting of exchange pinning field magnetization in more than one direction for several thin film structures on a single substrate has been achieved by first orienting the structures as needed. A layer of hard magnetic material is then deposited, suitably patterned to control the direction of its flux, and then magnetized through a single exposure to a strong magnetic field. The assemblage is then thermally annealed (in the absence of any applied field) at a temperature higher than the AFM material blocking temperature, following which the thin film structures are magnetically pinned in the intended directions.


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