The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2014
Filed:
Dec. 19, 2008
Darin W. Laird, Pittsburgh, PA (US);
Henning Richter, Newton, MA (US);
Viktor Vejins, Concord, MA (US);
Larry Scott, Newton, MA (US);
Thomas A. Lada, Ii, Brighton, MA (US);
Darin W. Laird, Pittsburgh, PA (US);
Henning Richter, Newton, MA (US);
Viktor Vejins, Concord, MA (US);
Larry Scott, Newton, MA (US);
Thomas A. Lada, II, Brighton, MA (US);
Plextronics, Inc., Pittsburgh, PA (US);
Nano-C, Inc., Westwood, MA (US);
Abstract
Improved methods of fullerene derivative production including use of less solvent, or elimination of solvent, as well as use of shorter reaction times and higher reaction temperatures. Methods useful for production of bis-, tris-, tetra-, penta-, and hexa-fullerene derivatives. Indene is a preferred derivative. The derivatives used in active layers for solar cell applications.