The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Jul. 21, 2011
Paul Ballintine, Pleasanton, CA (US);
Jaime Sarmiento, Tracy, CA (US);
Duane Smith, Pleasanton, CA (US);
Chad R. Weetman, Pleasanton, CA (US);
Paul Ballintine, Pleasanton, CA (US);
Jaime Sarmiento, Tracy, CA (US);
Duane Smith, Pleasanton, CA (US);
Chad R. Weetman, Pleasanton, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An architecture for creating a plasma-processing-related application is provided. The architecture includes a foundation layer having a plurality of framework components, wherein the framework components including at least one of security component, data management component and user interface (UI) component. The architecture also includes an analysis view layer having a set of views, wherein the set of views are generated utilizing components from the foundation layer. The architecture further includes an analysis module layer having a plurality of analysis modules, wherein each analysis module of the plurality of analysis modules is assembled from one or more view of the set of views. The architecture moreover includes an application layer having a plurality of applications, wherein each application of the plurality of applications is assembled from one or more analysis module.