The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Apr. 13, 2011
Serdar Manakli, Meyrie, FR;
Serdar Manakli, Meyrie, FR;
Abstract
A method of electron-beam lithography is provided, notably for technologies of critical dimension of the order of 22 nm. In such methods applied notably to networks of lines, the methods of the prior art do not offer precise and efficient correction of the shortenings of line ends. The method provided solves this problem by carrying out the insertion of contrast intensification structures of types which are optimized for the structure of the lines to be corrected. The method allows the semi-automatic or automatic calculation of the dimensions and locations of said structures. Advantageously, these calculations may be modeled to produce a target design, derived from libraries of components. They may be supplemented with a joint optimization of the size of the etchings and of the radiated doses, as a function of the process energy latitude.