The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2014

Filed:

Aug. 04, 2008
Applicants:

Tetsunori Tanaka, Osaka, JP;

Atsushi Ban, Osaka, JP;

Tohru Senoo, Osaka, JP;

Wataru Nakamura, Osaka, JP;

Yukimine Shimada, Osaka, JP;

Inventors:

Tetsunori Tanaka, Osaka, JP;

Atsushi Ban, Osaka, JP;

Tohru Senoo, Osaka, JP;

Wataru Nakamura, Osaka, JP;

Yukimine Shimada, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/136 (2006.01);
U.S. Cl.
CPC ...
Abstract

An active matrix substrate () of the present invention includes a substrate, a gate line () formed on the substrate, and an interlayer insulating layer () for insulating a layer formed on the gate line () from the gate line (). In a region of the substrate, the interlayer insulating layer () is not provided on an upper surface of the gate line (), and therefore, the upper surface is exposed. On the other hand, the insulating layer () is provided on the substrate so as to have contact with at least an edge face of the gate line () which edge face is on an extension of a longitudinal direction of the gate line ().


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