The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Jun. 01, 2007
Weisheng Lei, Portland, OR (US);
Hisashi Matsumoto, Hillsboro, OR (US);
Gregg Hardy, Portland, OR (US);
Yunlong Sun, Beaverton, OR (US);
Weisheng Lei, Portland, OR (US);
Hisashi Matsumoto, Hillsboro, OR (US);
Gregg Hardy, Portland, OR (US);
Yunlong Sun, Beaverton, OR (US);
Electro Scientific Industries, Inc., Portland, OR (US);
Abstract
A method of and an apparatus for drilling blind vias with selectable tapers in multilayer electronic circuits permit forming electrical connections between layers while maintaining quality and throughput. The method relies on recognizing that the top diameter of the via and the bottom diameter of the via, which define the taper, are functions of two separate sets of equations. Simultaneous solution of these equations yields a solution space that enables optimization of throughput while maintaining selected taper and quality using temporally unmodified Q-switched COlaser pulses with identical pulse parameters. Real time pulse tailoring is not required; therefore, system complexity and cost may be reduced.