The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Jul. 01, 2010
Applicants:
Ce MA, San Diego, CA (US);
Kee-chan Kim, Carlsbad, CA (US);
Graham Anthony Mcfarlane, Carlsbad, CA (US);
Inventors:
Ce Ma, San Diego, CA (US);
Kee-Chan Kim, Carlsbad, CA (US);
Graham Anthony McFarlane, Carlsbad, CA (US);
Assignee:
Linde Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/00 (2006.01); C07F 17/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Solution-based precursors for use as starting materials in film deposition processes, such as atomic layer deposition, chemical vapor deposition and metalorganic chemical vapor deposition. The solution-based precursors allow for the use of otherwise solid precursors that would be unsuitable for vapor phase deposition processes because of their tendency to decompose and solidify during vaporization.