The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2014
Filed:
Jul. 31, 2012
Daniel J. Arriola, Midland, MI (US);
Edmund M. Carnahan, Fresno, TX (US);
Yunwa Wilson Cheung, Lake Jackson, TX (US);
David D. Devore, Midland, MI (US);
David D. Graf, Midland, MI (US);
Phillip D. Hustad, Manvel, TX (US);
Roger L. Kuhlman, Charleston, WV (US);
Colin LI Pi Shan, Pearland, TX (US);
Benjamin C. Poon, Lake Jackson, TX (US);
Gordon R. Roof, Midland, MI (US);
James C. Stevens, Richmond, TX (US);
Pamela J. Stirn, Midland, MI (US);
Timothy T. Wenzel, Charleston, WV (US);
Daniel J. Arriola, Midland, MI (US);
Edmund M. Carnahan, Fresno, TX (US);
Yunwa Wilson Cheung, Lake Jackson, TX (US);
David D. Devore, Midland, MI (US);
David D. Graf, Midland, MI (US);
Phillip D. Hustad, Manvel, TX (US);
Roger L. Kuhlman, Charleston, WV (US);
Colin Li Pi Shan, Pearland, TX (US);
Benjamin C. Poon, Lake Jackson, TX (US);
Gordon R. Roof, Midland, MI (US);
James C. Stevens, Richmond, TX (US);
Pamela J. Stirn, Midland, MI (US);
Timothy T. Wenzel, Charleston, WV (US);
Dow Global Technologies LLC, Midland, MI (US);
Abstract
A composition for use in forming a multi-block copolymer, said copolymer containing therein two or more segments or blocks differing in chemical or physical properties, a polymerization process using the same, and the resulting polymers, wherein the composition comprises the admixture or reaction product resulting from combining: