The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2014

Filed:

Oct. 06, 2011
Applicants:

Bipin Thakur, Mumbai, IN;

Joe Griffith Cruz, San Jose, CA (US);

Stefan Keller, Mainaschaff, DE;

Vikas Gujar, Thane, IN;

Ravindra Janu Patil, Thane, IN;

Inventors:

Bipin Thakur, Mumbai, IN;

Joe Griffith Cruz, San Jose, CA (US);

Stefan Keller, Mainaschaff, DE;

Vikas Gujar, Thane, IN;

Ravindra Janu Patil, Thane, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for depositing films using hot wire chemical vapor deposition (HWCVD) processes are provided herein. In some embodiments, a method of operating an HWCVD tool may include providing hydrogen gas (H) to a filament disposed in a process chamber of the HWCVD tool for a first period of time; and flowing current through the filament to raise the temperature of the filament to a first temperature after the first period of time.


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